X-ray photoemission studies of the alkali halides

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چکیده ندارد.

Soft x-ray photoemission studies of Hf oxidation

Soft x-ray photoemission spectroscopy has been applied to determine the binding energy shifts and the valance band offset of HfO2 grown on Hf metal. Charging of oxide films upon x-ray exposure is found to be very severe and special care is taken to eliminate it. Photoemission results show the presence of metallic Hf ~from the substrate! with a 4 f 7/2 binding energy of 14.22 eV, fully oxidized ...

Studies of nanomagnetism using synchrotron-based x-ray photoemission electron microscopy (X-PEEM).

As interest in magnetic devices has increased over the last 20 years, research into nanomagnetism has experienced a corresponding growth. Device applications from magnetic storage to magnetic logic have compelled interest in the influence of geometry and finite size on magnetism and magnetic excitations, in particular where the smallest dimensions reach the important magnetic interaction length...

Frenkel Defects in Alkali Halides

Soft x-ray photoemission studies of the HfO2 ÕSiO2 ÕSi system

Soft x-ray photoelectron spectroscopy with synchrotron radiation was employed to study the valence-band offsets for the HfO2 /SiO2 /Si and HfO2 /SiOxNy /Si systems. We obtained a valence-band offset difference of 21.0560.1 eV between HfO2 ~in HfO2/15 Å SiO2 /Si! and SiO2 ~in 15 Å SiO2 /Si!. There is no measurable difference between the HfO2 valence-band maximum positions of the HfO2/10 Å SiOxNy...